Paper Title
Enhancement of Carbon Monoxide Sensor Using Igzo Thin Films by Ap-Pecvd

Abstract
In this study, we used atmospheric-pressure PECVD (AP-PECVD) to deposit the IGZO sensing layer. With the help of AP-PECVD, we can deposit our IGZO sensing layer without vacuum chamber or vacuum system, thus reducing the cost and increasing yield. The initial research focus on the deposition of the process parameters of the amorphous IGZO(a-IGZO) sensing layer and the sensing reaction to carbon monoxide. With the long-established theory and formula of the gas sensor, combined with the actual experiment and measurement, we can obtain the sensitivity, reaction time, response time, and other related parameters. To investigate the difference between theory and reality between a-IGZO and metal oxide. At the same time, AP-PECVD is used to perform plasma surface treatment on the deposited a-IGZO sensing layer, increasing the surface roughness of the sensor and the contact area with carbon monoxide, and then using scanning electron microscopy (SEM) and atomic force microscopy. (AFM) to analyze the surface and explores the effectiveness of this process for gas sensors. Keywords - IGZO Thin Films, Carbon Monoxide sensor