Automated Nano-Defect Review of Mechanical, Electrical and Chemical Characterization by Scanning Probe Microscopy
SPM technology is the most versatile tool born in the field of applied physics. SPM has now begun to be applied to high-tech industries such as next-generation semiconductor and display industries. With decreasing device sizes, nanometer-sized defects on the wafer substrates can already limit the performance of the devices. These defects' detection and precise classification require additional characterization methods with a resolution in the nanometer range. It is well known that Scanning Probe Microscopes (SPM) can measure not only surface morphology but also mechanical and electrical properties. However, the versatility of SPM is not fully utilized in industrial applications due to its various limitations. Various limitations include low throughput and tip life and laborious efforts to find the defects in inline automated defect review (ADR). This paper introduces the ADR SPM with mechanical and electrical characterization capability. In addition, newly developed Photonic induced Force Microscopy (PiFM) technology to obtain chemical signatures with 10 nm resolution.
Keywords - Scanning Probe Microscopy, Atomic Force Microscopy, Pinpoint Mechanical Analysis, Kelvin Probe Microscopy, Photonic Induced Force Microscopy.