Fabrication Optimization and Post-Processing Solutions for High-Resolution 3D Laser Lithography
Multiphoton polymerization-based 3D laser lithography is a well-established technique for producing structures with arbitrary 3D architecture with feature sizes down to sub-µm. In this work we present methodologies and considerations needed to push feature size to 150 nm and bellow. These include peculiarities of using specialized hybrid organic-inorganic photopolymer SZ2080 with varying degrees of photosensitization, accounting for line broadening due to radical diffusion and post processing solutions such as pyrolysis/calcination. Opportunities and challenges related to these approaches are discussed with possibilities to use in wide-spread applications highlighted.
Keywords - 3D Laser Lithography, Femtosecond Lasers, Hybrid Polymers, Nanostructures, Calcination.