Paper Title
TiO2 Nanostructure Growthvia Liquid Phase Deposition (LPD)

Abstract
Titanium oxide (TiO2) is a semiconductor material which shows photocatalytic effect, being used as a deodorizing, antibacterial, and antifouling action when exposed to ultraviolet light.[1] As a method to produce TiO2, liquid phase deposition (LPD) has an advantage, that it can be at a low temperature and atmospheric pressure.[2]In this study, we investigated the growth steps of TiO2 films by LPD. A quartz substrate and sputtered TiO2 substrate were immersed in a mixture of 0.1 mol/L (NH4)2TiF6 and 0.3 mol/L H3BO3 for 10 min, 30 min, 60 min, 120 min and 180 min at 60 °C. The products were characterized by several microscopic and spectroscopic techniques. The Raman spectra and X-ray diffraction(XRD) revealed that the anatase phase of TiO2 was formed after a reaction for 60 min. Scanning electron microscope (SEM) was employed to observe the size and shape of the TiO2nanostructures. As a result, it was found that TiO2 crystal grew into a flower-like lump shapeon a quartz substrate, while particle size increased with the deposition time. The average particle size is seen to be 475 nm with 180 min deposition time. (Fig.1(a))On the other hand, on a sputtered TiO2 film, TiO2 crystals are found in Fig.2(b) to grow as density-packing islands. We expect that seed crystals accelerated the nucleation reactions, which lead to the formation of TiO2 nanostructured film.