Paper Title
Optical and Structural Properties Of Electrodeposited Thin Film CU2O

Abstract
Polycrystalline Cu2O layers have been prepared by cathodic reduction of an alkaline cupric sulfate solution on transparent conducting glass (FTO). X-ray diffraction (XRD) study revealed the formation of single cubic Cu2O films. The nanocrystallite size is about 28 nm. The as-deposited films thickness was estimated at approximately 6�m. The effect of pH solution on the structure is studied. Scanning electron microscopy image shows the pyramid structure of Cu2O thin film deposited at -0.555V versus Ag/AgCl. The band gap of the film was estimated from transmittance spectra to be about 2.34eV. Index Terms� Cu2O, Electrodeposition, optical properties, structural properties.